Lam Research 716-230577-384 Ring Assembly – Etch Chamber Consumable | Lam Research Kiyo / Flex Platform
Engineering Background: The Ring Assembly (P/N 716-230577-384, cross-reference 716-230577-941 / 0020-22585) is a precision-machined consumable component used in Lam Research plasma etch systems. Designed to maintain plasma confinement geometry and protect chamber walls during high-energy etch processes, this part is critical to process repeatability and wafer yield.
Product Positioning: Sourced from verified OEM-grade supply chains, this ring assembly is suitable for direct drop-in replacement in qualified Lam Research etch chambers. Konmask.com supplies this component to semiconductor fabs, equipment service providers, and MRO procurement teams worldwide.
Complete Technical Specifications
- Manufacturer: Lam Research Corporation
- Primary Part Number: 716-230577-384
- Cross-Reference P/N: 716-230577-941 | 0020-22585
- Component Type: Ring Assembly (Chamber Consumable)
- Platform Compatibility: Lam Research Kiyo / Flex Etch Systems
- Material: Precision-machined (OEM specification)
- Weight: 20 g (nominal)
- Country of Origin: United States
- Condition: New / Refurbished (specify at inquiry)
Proven Application Environments
- Plasma etch chambers requiring tight plasma confinement
- High-volume semiconductor fabs (logic, memory, foundry)
- Equipment OEM service and refurbishment operations
- Preventive maintenance (PM) kits for Lam Research etch tools
- Advanced packaging and MEMS process lines
Engineering Advantages
- OEM-equivalent dimensional tolerances ensure drop-in fit without chamber re-qualification
- Maintains plasma uniformity across wafer surface for consistent CD control
- Reduces particle contamination risk versus worn or non-OEM alternatives
- Supports extended PM intervals when replaced on schedule
- Traceable lot documentation available upon request
System Architecture & Signal Flow
In a Lam Research capacitively coupled plasma (CCP) etch system, the Ring Assembly sits at the chamber periphery, forming a controlled boundary between the plasma zone and the chamber liner. It works in conjunction with the focus ring, edge ring, and confinement ring to shape the electric field distribution and gas flow dynamics. Proper seating and condition of this assembly directly impacts etch rate uniformity, selectivity, and endpoint detection accuracy.
Sourcing & Quality Verification
- All parts are inspected upon receipt against OEM dimensional drawings
- Serialized traceability records maintained for each shipment
- Anti-static packaging and cleanroom-compatible handling as standard
- Certificate of Conformance (CoC) available on request
- RoHS compliance documentation available
Procurement Process
- Submit your RFQ via the product page or email [email protected] with quantity and required delivery date
- Receive a formal quotation with lead time, CoC availability, and shipping options within 1 business day
- Confirm purchase order — we accept T/T, PayPal, and major credit cards
- Parts shipped with full documentation; tracking provided within 24 hours of dispatch
- Post-delivery technical support available for installation and compatibility queries
Technical FAQ
Q: Is 716-230577-941 a direct replacement for 716-230577-384?
A: Yes. 716-230577-941 and 0020-22585 are cross-reference part numbers for the same assembly. Confirm your tool revision with our engineers if uncertain.
Q: What is the recommended replacement interval?
A: Lam Research recommends replacement based on RF hours and etch process chemistry. Consult your tool PM schedule or contact us for guidance.
Q: Can this part be used in non-Lam Research systems?
A: This part is designed specifically for Lam Research etch platforms. Cross-platform compatibility is not guaranteed without engineering review.
Q: Do you offer volume pricing?
A: Yes. Contact [email protected] for volume discount tiers and blanket order arrangements.
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