LAM RESEARCH 716-230577-371 – Etch Chamber Edge Ring | Kiyo & Versys Platform
Engineering Background: In plasma etch processes, the edge ring (also known as focus ring or confinement ring) is a critical consumable that defines the plasma boundary at the wafer edge. Precise ring geometry directly controls etch uniformity, CD (critical dimension) control, and wafer-edge yield. LAM RESEARCH engineers this component to exacting tolerances for their Kiyo and Versys etch platforms, where sub-millimeter dimensional drift translates to measurable process excursions.
Product Positioning: Part number 716-230577-371 (cross-referenced as 0190-40177 and 0240-23355) is a direct OEM-specification replacement ring for Lam Research etch chambers. Sourced through verified industrial channels, this part is available at Konmask.com for global semiconductor fabs, equipment refurbishers, and MRO procurement teams requiring traceable, spec-compliant consumables.
Complete Technical Specifications
- Manufacturer: LAM RESEARCH Corporation
- Primary Part Number: 716-230577-371
- Cross-Reference PN: 0190-40177 | 0240-23355
- Component Type: Edge Ring / Focus Ring / Confinement Ring
- Compatible Platform: Lam Research Kiyo Series | Versys Series Etch Systems
- Material: High-purity ceramic / quartz / silicon carbide (OEM-specified per chamber configuration)
- Function: Plasma confinement and wafer-edge etch uniformity control
- Country of Origin: United States
- Weight: ~2,600 g (shipping weight)
- Condition: New / Refurbished (specify at inquiry)
Proven Application Environments
- Logic & Memory Fabs: Used in high-volume DRAM, NAND, and logic device etch processes where wafer-edge uniformity is critical to die yield
- Advanced Packaging: TSV (Through-Silicon Via) and RDL etch applications requiring tight CD control at wafer periphery
- R&D & Pilot Lines: Process development environments running Lam Kiyo or Versys chambers for new node qualification
- Equipment Refurbishment: OEM-spec replacement for refurbishers restoring Lam Research etch tools to factory performance
- Spare Parts Inventory (MRO): Stocked by fab MRO teams as a scheduled consumable replacement to minimize unplanned downtime
Engineering Advantages
- OEM-Matched Geometry: Dimensional tolerances match Lam Research factory specifications — no process re-qualification required upon installation
- Plasma Uniformity: Maintains consistent plasma sheath at wafer edge, reducing edge die loss and improving overall wafer yield
- Extended Service Life: High-purity material composition resists erosion under aggressive fluorine and chlorine plasma chemistries
- Drop-In Replacement: Direct fit for compatible chamber configurations — no hardware modification required
- Traceable Sourcing: Each unit sourced through documented supply channels with part number verification
System Architecture & Signal Flow
In a Lam Research capacitively coupled plasma (CCP) etch chamber, the edge ring sits concentrically around the electrostatic chuck (ESC), defining the outer boundary of the plasma confinement zone. RF power delivered to the chuck creates a plasma sheath; the ring geometry controls sheath uniformity at the wafer edge. As the ring erodes over its service life (measured in RF hours or wafer passes), etch rate and uniformity at the wafer edge degrade — triggering a scheduled PM replacement. Part 716-230577-371 restores the chamber to baseline performance at each PM cycle.
Replacement Trigger Indicators:
- Increased edge etch rate non-uniformity (>±2% edge delta)
- Visual erosion grooves or pitting on ring surface
- Scheduled PM interval reached (per fab process recipe)
- Post-PM qualification wafer showing edge CD drift
Sourcing & Quality Verification
- Part Number Verification: All units verified against primary PN 716-230577-371 and cross-references 0190-40177 / 0240-23355 prior to shipment
- Dimensional Inspection: Key dimensions checked against OEM drawing tolerances
- Visual QC: Surface inspection for chips, cracks, or contamination before packaging
- Packaging: Clean-room compatible packaging to prevent particle contamination during transit
- Documentation: Certificate of conformance and part traceability documentation available upon request
Procurement Process
- Submit Inquiry: Contact [email protected] with your required quantity, condition preference (new/refurbished), and delivery timeline
- Quote & Lead Time: Receive a formal quotation with confirmed stock status and lead time within 24 business hours
- Order Confirmation: Purchase order accepted via email; payment terms discussed per account type
- QC & Shipment: Part inspected, documented, and shipped with tracking — worldwide export available
- After-Sales Support: Technical questions and installation support available via email or phone
Technical FAQ
Q: Is 716-230577-371 compatible with all Lam Research etch chambers?
A: This part is designed for specific Lam Research Kiyo and Versys series chamber configurations. Please confirm your exact tool model and chamber type with our team before ordering to ensure dimensional compatibility.
Q: What is the difference between 716-230577-371, 0190-40177, and 0240-23355?
A: These are cross-reference part numbers used by different procurement systems for the same physical component. 716-230577-371 is the primary Lam Research PN; 0190-40177 and 0240-23355 are alternate catalog references for the same part.
Q: Do you supply new or refurbished rings?
A: Both conditions are available subject to stock. Please specify your requirement at inquiry. All units undergo the same QC inspection regardless of condition.
Q: Can you provide a certificate of conformance?
A: Yes. Documentation including part traceability and inspection records is available upon request for all orders.
Q: What is the typical lead time?
A: In-stock units ship within 3–5 business days. Out-of-stock items are subject to sourcing lead time — typically 2–6 weeks depending on supply availability. Contact us for current stock status.
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